Electron beam lithography system.

A simple electron-beam lithography system.

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard S...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

Performance of the Raith 150 electron-beam lithography system

The performance of a Raith 150 electron-beam lithography system is reported. The system’s resolution, stability, intrafield distortion, stitching, and overlay performance are evaluated. Patterning at lowand high-acceleration voltages is compared. The system was used to pattern sub-20 nm features, and the largest intrafield distortion for a 100 mm field was measured to be 15 nm. Pattern-placemen...

A Precision High - Speed Electron Beam Lithography System

A product of HP's research labs, it'llbe used in-house to make very-large-scale integrated circuits and other advanced devices. The column's field emission electron gun contributes fo fhe system's high speed. The pattern dataturns the electron beam on and off at rates as high as 300 MHz. Precision ts achieved by measuring disfortlons and correcting them with software and electronics. Digital Ad...